PUBLICATION

Advanced Display and Nano Convergence Laboratory

Journal

Journal

2016 Influence of the charge trap density distribution in a gate insulator on the positive-bias stress instability of amorphous indium-gallium-zinc oxide thin-film transistors

본문

Author
Eungtaek Kim+, Choong-Ki Kim+, Myung Keun Lee, Tewook Bang, Yang-Kyu Choi, Sang-Hee Ko Park*, Kyung Cheol Choi*
Journal
Applied Physics Letters
Year
2016
Status
May, Published