2016 Pattern distortion analysis of surface plasmon interference lithography using line grating structure on photoresist 본문 Author Yong Min Kim, and Kyung Cheol Choi* Journal IEEE transaction on nanotechnology Volume/Issue 15, 2 Year 2016 Status 220-224, March, Published Link https://doi.org/10.1109/TNANO.2016.2514407 423회 연결 목록 이전글Reliable thin-film encapsulation of flexible OLEDs and enhancing their bending characteristics through mechanical analysis 25.06.21 다음글Highly Reliable Hybrid Nano-stratified Moisture Barrier for Encapsulating Flexible OLEDs 25.06.21