2014 The Effect of the Ratio of Lines to Spaces for Nano-Lithography Using Surface Plasmons 본문 Author Eun Sung Kim and Kyung Cheol Choi Journal IEEE TRANSACTIONS ON NANOTECHNOLOGY Volume/Issue 13, 2 Year 2014 Status 203-207, March, Published Link https://doi.org/10.1109/TNANO.2013.2296095 407회 연결 검색 목록 이전글Reduction intermediates of graphene oxide for low temperature reduction electrode material 25.06.21 다음글(Frontispiece) Photo-Insensitive Amorphous Oxide Thin-Film Transistor Integrated with Plasmonic Filter for Transparent Electronics 25.06.21